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M01500 - SEMI M15 - 半絶縁ガリウムヒ素ウェーハ用の鏡面ウェーハの許容表面欠陥表 Revision:SEMI M15-0298 - Inactive The purpose of this Test

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Description

The purpose of this Test Method is to standardize analytical protocols for the measurement of oxygen concentration in photovoltaic (PV) silicon materials

The metrics can be used in a process of ongoing improvement that can be visible to all levels of a semiconductor manufacturing organization

This Test Method covers measurement of polarizer contrast

process equipment

M01500 - SEMI M15 - 半絶縁ガリウムヒ素ウェーハ用の鏡面ウェーハの許容表面欠陥表 Revision:SEMI M15-0298 - Inactive The purpose of this TestGaAs Referenced SEMI Standards None.

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