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Cleaning reaction After the deprotection reaction is completed, add an appropriate amount of water and organic solvent (such as DMF), stir evenly, let it stand for layering, discard the water layer, and wash repeatedly to remove residual deprotection reagents and other impurities
The chlorine atom in TMQ0153 forms a weak hydrogen bond with T503 and a noncovalent interaction with D470 [62]
H tr trong iu tr vim tu cp: 600 mg - 1200 mg/ngy, tim tnh mch chm
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